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锡酸铟 溅射靶材

锡酸铟 溅射靶材, , 结构式
锡酸铟 溅射靶材
CAS号:
英文名:
Indium tin oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 10% wt, 99.99% (metals basis)
英文别名:
Indium tin oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis);Indium tin oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis);Indium tin oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.25in) thick, 99.99% (metals basis);Indium tin oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 10% wt, 99.99% (metals basis)
中文名:
锡酸铟 溅射靶材
中文别名:
锡酸铟 溅射靶材;氧化铟锡溅射靶材, 76.2MM (3.0IN) DIA X 3.18MM (0.13IN) THI;氧化铟锡溅射靶材, 50.8MM (2.0IN) DIA X 6.35MM (0.25IN) THI;氧化铟锡溅射靶材, 50.8MM (2.0IN) DIA X 3.18MM (0.13IN) THI;氧化铟锡溅射靶材, 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THI
CBNumber:
CB02077732
分子式:
In2O7Sn2
分子量:
579.0518
MOL File:
Mol file

锡酸铟 溅射靶材化学性质

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锡酸铟 溅射靶材 相关搜索:

氧化铟 铟 氧化铟锡
  • 氧化铟锡溅射靶材, 76.2MM (3.0IN) DIA X 3.18MM (0.13IN) THI
  • 氧化铟锡溅射靶材, 50.8MM (2.0IN) DIA X 6.35MM (0.25IN) THI
  • 氧化铟锡溅射靶材, 50.8MM (2.0IN) DIA X 3.18MM (0.13IN) THI
  • 氧化铟锡溅射靶材, 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THI
  • 锡酸铟 溅射靶材
  • Indium tin oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 10% wt, 99.99% (metals basis)
  • Indium tin oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
  • Indium tin oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
  • Indium tin oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.25in) thick, 99.99% (metals basis)
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