氧化锆氧化钇基片

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• ZrO2Y2O35Stabilized
• ZrO295Y2O3
• 氧化锆氧化钇基片, 10X10X1MM, 两面抛光, 100 ORIENTATION
• 氧化锆氧化钇基片, 10X10X0.5MM, 两面抛光, 100 ORIENTATION
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• 钇酸锆基片, 10X10X0.5MM,一面抛光, 100 ORIENTATION
• 氧化锆/氧化钇耙材, 10X10X1MM, POLISHED 2 SIDES, 100 ORIEN
• 氧化锆氧化钇基片, 10X10X0.5MM, POLISHED 2 SIDES, 100 ORIEN
• 氧化锆/氧化钇耙材, 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) T
• 氧化锆/氧化钇耙材, 50.8MM (2.0IN) DIA X 3.18MM (0.13IN) T
• 氧化锆氧化钇基片, 10X10X0.5MM, POLISHED ONE SIDE, 100 ORIE
• 氧化锆氧化钇基片,10X10X0.5MM,POLISHEDONESIDE,100ORIENTATION
• 氧化锆/氧化钇耙材,10X10X1MM,POLISHED2SIDES,100ORIENTATION
• 氧化锆/氧化钇耙材, 76.2MM (3.0IN) DIA X 3.18MM (0.13IN) T
• 氧化锆/氧化钇耙材, 50.8MM (2.0IN) DIA X 6.35MM (0.25IN) T
• 氧化锆氧化钇基片, 10X10X1MM, POLISHED ONE SIDE, 100 ORIENT
• 氧化锆氧化钇基片,10X10X1MM,POLISHEDONESIDE,100ORIENTATION
• 氧化锆氧化钇基片,10X10X0.5MM,POLISHED2SIDES,100ORIENTATION
• 氧化锆/氧化钇耙材
• 氧化锆氧化钇基片
• 氧化锆/氧化钇靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.9% (METALS BASIS EX. HF)
• 氧化锆/氧化钇靶, 76.2MM (3.0IN) 直径 X 3.18MM (0.13IN) 厚, 99.9% (METALS BASIS EX. HF)
• 氧化锆/氧化钇靶, 50.8MM (2.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.9% (METALS BASIS EX. HF)
• 氧化锆/氧化钇靶, 50.8MM (2.0IN) 直径 X 3.18MM (0.13IN) 厚, 99.9% (METALS BASIS EX. HF)
• 氧化锆/氧化钇耙材,50.8MM(2.0IN)DIAX3.18MM(0.13IN)THICK,99.9%(METALSBASISEX.HF)
• 氧化锆/氧化钇耙材,50.8MM(2.0IN)DIAX6.35MM(0.25IN)THICK,99.9%(METALSBASISEX.HF)
• 氧化锆/氧化钇耙材,76.2MM(3.0IN)DIAX6.35MM(0.25IN)THICK,99.9%(METALSBASISEX.HF)
• 氧化锆/氧化钇耙材,76.2MM(3.0IN)DIAX3.18MM(0.13IN)THICK,99.9%(METALSBASISEX.HF)
• Zirconium Oxide Yttrium Oxide Substrate, Polished One Side
• Zirconium oxide/Yttrium oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.9% (
• Zirconium oxide/Yttrium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.13in) thick, 99.9% (
• Zirconium oxide/Yttrium oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.9% (
• Zirconium oxide Yttrium oxide substrate, 10x10x0.5mm, polished one side, 100 orientation
• Zirconium oxide/Yttrium oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.9% (metals basis ex. Hf)
• Zirconium oxide/Yttrium oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.25in) thick, 99.9% (metals basis ex. Hf)
• Zirconium oxide Yttrium oxide substrate, 10x10x1mm, polished one side, 100 orientation
• Zirconium oxide/Yttrium oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.9% (metals basis ex. Hf)
• Zirconium oxide Yttrium oxide substrate, 10x10x1mm, polished 2 sides, 100 orientation
• Zirconium oxide/Yttrium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.13in) thick, 99.9% (metals basis ex. Hf)
• Zirconium oxide Yttrium oxide substrate, 10x10x0.5mm, polished 2 sides, 100 orientation
• ZIRCONIUM OXIDE YTTRIUM OXIDE SUBSTRATE
• ZIRCONIUM OXIDE YTTRIUM OXIDE