BUFFER SOLUTION | 53744-42-6

BUFFER SOLUTION Properties

Melting point	300 °C
Density	1.006 g/mL at 20 °C
vapor density	4.9 (vs air)
storage temp.	Inert atmosphere,Room Temperature
solubility	H₂O: soluble
form	Liquid
color	No Color
Exposure limits	ACGIH: TWA 2.5 mg/m3 NIOSH: IDLH 250 mg/m3; TWA 2.5 mg/m3
EPA Substance Registry System	Benzenesulfonic acid, 4,4'-(1,10-phenanthroline-4,7-diyl)bis-, disodium salt (53744-42-6)

SAFETY

Risk and Safety Statements

Symbol(GHS)

GHS07

Signal word

Warning

Hazard statements

H315-H319-H335

Precautionary statements

P261-P305+P351+P338

Hazard Codes

Xi,C

Risk Statements

36/38-36/37/38-36-52/53-35-67

Safety Statements

26-36-24/25-37/39-61-45-36/37/39

RIDADR

UN2817

WGK Germany

3

F

8-10

HS Code

2933.99.8210

HazardClass

8

PackingGroup

III

NFPA 704

	0
4		1

BUFFER SOLUTION price More Price(46)

Manufacturer	Product number	Product description	CAS number	Packaging	Price	Updated	Buy
TCI Chemical	B0989	Bathophenanthrolinedisulfonic Acid Disodium Salt Hydrate[for Determination of Ferrous Ion]	53744-42-6	1g	$203	2024-03-01	Buy
Alfa Aesar	044627	Buffer HF-Improved	53744-42-6	250ml	$29.7	2023-06-20	Buy
Alfa Aesar	044627	Buffer HF-Improved	53744-42-6	1L	$72.3	2023-06-20	Buy
GFS CHEMICALS	18364	BUFFERPH12.45	53744-42-6	6x500mL	$82.07	2021-12-16	Buy
GFS CHEMICALS	18393	BUFFERPH3.00	53744-42-6	6x500mL	$82.07	2021-12-16	Buy

Product number	Packaging	Price	Buy
B0989	1g	$203	Buy
044627	250ml	$29.7	Buy
044627	1L	$72.3	Buy
18364	6x500mL	$82.07	Buy
18393	6x500mL	$82.07	Buy

BUFFER SOLUTION Chemical Properties,Uses,Production

Uses

Used for pretreatment of planar silicon devices when plating with Nickel plating solution products 44069 and 44070.

Uses

Use of Buffer HF improved:

Buffer HF improved dissolves silica films (both thermally grown and silane SiO₂) produced on the surfaces of silicon and exposed by photolithography. It also is capable of dissolving doped silica films such as phosphosilica and borosilica glasses as formed in semiconductor processing.
The overall chemical reaction is: 4HF + SiO₂ SiF₄ + 2H₂O
For trouble-free operation Buffer HF improved is recommended in the new technologies for manufacture of semiconductor planar and mesa devices. It is compatible with both negative and positive photoresists. Excellent results with good reproducibility are simple to achieve without undercutting marked oxides, surface staining or device degradation by metallic impurities.

Uses

Use of Buffer HF improved:

Buffer HF improved dissolves silica films (both thermally grown and silane SiO₂) produced on the surfaces of silicon and exposed by photolithography. It also is capable of dissolving doped silica films such as phosphosilica and borosilica glasses as formed in semiconductor processing. The overall chemical reaction is: 4HF + SiO₂ SiF₄ + 2H₂O
For trouble-free operation Buffer HF improved is recommended in the new technologies for manufacture of semiconductor planar and mesa devices. It is compatible with both negative and positive photoresists. Excellent results with good reproducibility are simple to achieve without undercutting marked oxides, surface staining or device degradation by metallic impurities.

Definition

ChEBI: Disodium 4,7-diphenyl-1,10-phenanthroline 4',4''-disulfonate is an organic sodium salt having 4,7-diphenyl-1,10-phenanthroline 4',4''-disulfonate as the counterion. It has a role as an iron chelator. It contains a 4,7-diphenyl-1,10-phenanthroline 4',4''-disulfonate.

General Description

Improved HF Buffer System with stabilized HF activity - selective solvent for SiO2 used in semiconductor technology of planar passivated devices - transistors, integrated circuits, diodes, rectifiers, SCR, MOS, FET

Advantages:

Ready-to-use - Economical
HF activity buffer stabilized
Excellent process reproducibility
Does not undercut masked oxide
Will not stain diffused silicon surfaces
Avoids contamination on silicon surfaces
Photoresist coating unaffected

Buffer HF improved is an idealized buffer preparation characterized by a high buffer index and an optimized, uniform oxide-etch rate. The composition of buffer HF improved is precisely controlled by HF activity measurements and electrometric pH. The mass balance corresponds essentially to (HF) + (F) + 2(HF₂) for a two-ligand mononuclear complex and the charge balance is (H⁺) - (F) + (HF^2- ). The HF activity is maintained constant through the specific equilibrium constant which regulates the equilibrium reaction between fluoride, bifluoride, and HF buffer components. A second equilibrium constant participates in the regulation of the hydronium in concentration of pH.

Buffer HF improved is produced and analyzed to be essentially free of impurities. Nitrate ions, a common impurity causing stains on diffused silicon surfaces, are specifically removed. Heavy metal impurities, which can lead to degradation of device characteristics, are rigidly controlled under manufacturing process specifications.

BUFFER SOLUTION Preparation Products And Raw materials

Raw materials

Preparation Products

BUFFER SOLUTION Suppliers

Global( 125)Suppliers

Supplier	Tel	Email	Country	ProdList	Advantage
Shenzhen Nexconn Pharmatechs Ltd	+86-755-89396905 +86-15013857715	admin@nexconn.com	China	10248	58
Shenyang Simchoice Chemical Co.,Ltd	+86-024-23769576 +86-15040101888	sales@simchoicechem.com	China	255	58
Shaanxi Dideu Medichem Co. Ltd	+86-029-81148696 +8615536356810	1047@dideu.com	China	3408	58
Career Henan Chemica Co	+86-0371-86658258 15093356674;	laboratory@coreychem.com	China	30255	58
ANHUI WITOP BIOTECH CO., LTD	+8615255079626	eric@witopchemical.com	China	23556	58
Dideu Industries Group Limited	+86-29-89586680 +86-15129568250	1026@dideu.com	China	29220	58
Nanjing Duly Biotech Co.,Ltd	+undefined18013301590	melody@njduly.com	China	2452	58
SUZHOU SENFEIDA CHEMICAL CO.,LTD	+86-0512-83500002 +8615195660023	sales@senfeida.com	China	5100	58
Shanghai Acmec Biochemical Technology Co., Ltd.	+undefined18621343501	product@acmec-e.com	China	33349	58
Jilin Chinese Academy of Sciences-yanshen Technology	+undefined18143011203	info@chemextension.com	China	42057	58

Supplier	Advantage
Shenzhen Nexconn Pharmatechs Ltd	58
Shenyang Simchoice Chemical Co.,Ltd	58
Shaanxi Dideu Medichem Co. Ltd	58
Career Henan Chemica Co	58
ANHUI WITOP BIOTECH CO., LTD	58
Dideu Industries Group Limited	58
Nanjing Duly Biotech Co.,Ltd	58
SUZHOU SENFEIDA CHEMICAL CO.,LTD	58
Shanghai Acmec Biochemical Technology Co., Ltd.	58
Jilin Chinese Academy of Sciences-yanshen Technology	58

View Lastest Price from BUFFER SOLUTION manufacturers

Image	Update time	Product	Price	Min. Order	Purity	Supply Ability	Manufacturer
	2020-01-05	Buffer Solution 53744-42-6	US $0.10 / KG	1KG	99.0%	1000 tons	Shaanxi Dideu Medichem Co. Ltd

Buffer Solution
53744-42-6
US $0.10 / KG
99.0%
Shaanxi Dideu Medichem Co. Ltd

53744-42-6(BUFFER SOLUTION)Related Search:

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1,10-Phenanthroline,4,7-di(phenylsulfonicacid)-,disodiumsalt 4,4’-(1,10-phenanthroline-4,7-diyl)bis-benzenesulfonicacidisodiumsalt 4,7-di(4-Phenylsulfonicacid)-1,10-phenanthroline,disodiumsalt Benzenesulfonicacid,4,4’-(1,10-phenanthroline-4,7-diyl)bis-,disodiumsalt BATHOPHENANTHROLINEDISULFONIC ACID, DISODIUM SALT HYDRATE BATHOPHENANTHROLINE DISULFONIC ACID NA2-SALT H20 SODIUM PHOSPHATE DIBASIC-SODIUM HYDROXIDE BUFFER TE BUFFER SOLUTION, PH 8.0 RED HIGH-ACCURACY BUFFER SOLUTION, PH 4.000 REFERENCE BUFFER SOLUTION PHOSPHATE-CHLORINE BUFFER PHOSPHATE BUFFER, PH 5.8 PHOSPHATE BUFF, PH 7.2 PH 11.00 BUFFER POTASSIUM PHOSPHATE MONOBASIC - SODIUM PHOSPHATE DIBASIC BUFFER POTASSIUM CHLORIDE-HYDROCHLORIC ACID BUFFER POTASSIUM CARBONATE-POTASSIUM BORATE-POTASSIUM HYDROXIDE BUFFER POTASSIUM ACID PHTHALATE-HYDROCHLORIC ACID BUFFER POTASSIUM ACID PHTHALATE - SODIUM HYDROXIDE BUFFER BUFFER SOLUTION PH 6.79 BUFFER SOLUTION PH 6.86 BUFFER SOLUTION PH 6.865 BUFFER SOLUTION PH 6.88 BUFFER SOLUTION PH 6.00 BUFFER SOLUTION PH 5.00 BUFFER SOLUTION, PH 5.00, +0.02 BUFFER SOLUTION, PH 5.0 BUFFER SOLUTION PH 7.413 BUFFER SOLUTION, PH 7.2, PHOSPHATE BUFFER SOLUTION PH 7.70 BUFFER SOLUTION PH 8.00 BUFFER SOLUTION, PH 9.0 BUFFER SOLUTION PH 9.00 BLUE BUFFER SOLUTION PH 9.180 BUFFER SOLUTION PH 9.22 BUFFER SOLUTION PH 9.23 BUFFER SOLUTION PH 9.00 BUFFER SOLUTION, PH 8.0 BUFFER SOLUTION PH 8.90 BUFFER SOLUTION, PH 9.54 BUFFER SOLUTION, TISAB BUFFER TNE 10X SOLUTION BUFFER TABLETS, PH 6.4 BUFFER TABLETS, PH 6.8 BUFFER TABLETS, PH 7.2 BUFFER TRIS, ACN AND EDTA SOLUTION BUFFER TRIS ACN, EDTA, NACL SOLUTION BUFFER SOLUTION A BUFFER RINSE SOLUTION BUFFER, SODIUM PHOSPHATE, PH 7.0 BUFFER SODIUM PHOSPHATE, PH 7.4 BUFFER PHOSPHATE, PH 7.40 BUFFER POTASSIUM PHOSPHATE BUFFER SOLUTION PH 10.00 BUFFER SOLUTION B BUFFER SOLUTION 'B' BUFFER SOLUTION PH 1.00 BUFFER SOLUTION PH 10.012