2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン
2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン 物理性質
- 融点 :
- 710°C
- 沸点 :
- 1007 °C
- 比重(密度) :
- 6.82 g/mL at 25 °C(lit.)
- 溶解性:
- insoluble in H2O
- 外見 :
- ピース
- 比重:
- 6.82
- 色:
- グレー
- 水溶解度 :
- 空気中で加熱することにより分解することができます。硝酸、王水に分解し、強酸に可溶。水、有機溶剤に不溶。
- Crystal Structure:
- Cubic, Halite Structure - Space Group Fm3m
- Merck :
- 14,1278
- 暴露限界値:
- ACGIH: TWA 0.2 mg/m3
NIOSH: IDLH 1 mg/m3; TWA 0.2 mg/m3
- CAS データベース:
- 12068-69-8(CAS DataBase Reference)
- EPAの化学物質情報:
- Bismuth selenide (Bi2Se3) (12068-69-8)
2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン 価格
もっと(4)
メーカー |
製品番号 |
製品説明 |
CAS番号 |
包装 |
価格 |
更新時間 |
購入 |
富士フイルム和光純薬株式会社(wako)
|
W01ALF013126 |
セレン化ビスマス(III), Vacuum Deposition Grade, 99.999% (metals basis)
Bismuth(III) selenide, Vacuum Deposition Grade, 99.999% (metals basis) |
12068-69-8 |
10g |
¥38400 |
2024-03-01 |
購入 |
富士フイルム和光純薬株式会社(wako)
|
W01ALF013126 |
セレン化ビスマス(III), Vacuum Deposition Grade, 99.999% (metals basis)
Bismuth(III) selenide, Vacuum Deposition Grade, 99.999% (metals basis) |
12068-69-8 |
50g |
¥153900 |
2024-03-01 |
購入 |
Sigma-Aldrich Japan
|
733504 |
セレン化ビスマス granular (melted), 99.999% trace metals basis
Bismuth selenide granular (melted), 99.999% trace metals basis |
12068-69-8 |
5g |
¥8790 |
2024-03-01 |
購入 |
Sigma-Aldrich Japan
|
401080 |
Bismuth(III) selenide |
12068-69-8 |
5g |
¥9700 |
2021-03-23 |
購入 |
2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン 化学特性,用途語,生産方法
化学的特性
black crystal(s), 1–6mm pieces (fused) of 99.999% purity; rhomb and hexagonal; decomposes when heated in air, by conc HNO3 and by aqua regia; used in semiconductors and in the form of a 99 or 99.999% pure material used as a sputtering target to produce multilayer thin films and magneto?resistant films [HAW93] [MER06] [CER91]
一般的な説明
This product has been enhanced for energy efficiency.
2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン 上流と下流の製品情報
原材料
準備製品
2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン 生産企業
Global( 98)Suppliers
12068-69-8(2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン)キーワード:
- 12068-69-8
- bismuthselenide(bi2se3)
- BISMUTH SELENIDE
- BISMUTH(III) SELENIDE
- vacuumdepositiongrade,99.999%(metalsbasis)
- bismuth(iii) selenide, vacuum deposition grade
- Bismuth(III) selenide, Vacuum Deposition Grade, 99.999% (metals basis)
- 2,4,5-Triselena-1,3-dibismabicyclo[1.1.1]pentane
- dibismuth triselenide
- Bismuth sesquiselenide
- Bismuth selenide granular (melted), 99.999% trace metals basis
- Bismuth(III) selenide (Bi2Se3)
- Bismuth(III) selenide, 99.999% trace metals basis
- Bismuth(III) selenide lump
- Bismuth selenide BiSe3
- BISMUTH SELENIDE ISO 9001:2015 REACH
- Dibismuttriselenid
- Tantalum Sulfide (TaS2) Sputtering Targets
- Bismuth selenide doped with iron, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Fe)
- Bismuth selenide doped with copper, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cu)
- Bismuth selenide, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95%
- Bismuth selenide doped with manganese, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Mn)
- Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Co)
- Bismuth selenide doped with chromium, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cr)
- Bismuth selenide doped with nickel, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Ni)
- Bismuth selenide doped with iron, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Fe)
- Bismuth selenide doped with manganese, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Mn)
- Bismuth selenide doped with nickel, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Ni)
- Bismuth selenide, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95%
- Bismuth selenide doped with chromium, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cr)
- Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Co)
- 2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン
- セレン化ビスマス
- セレン化ビスマス(III), Vacuum Deposition Grade, 99.999% (metals basis)
- セレニドビスマス(III)
- 三セレン化二ビスマス