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HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)

化学構造式
CAS番号.
化学名:
别名:
英語名:
HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
英語别名:
HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
CBNumber:
CB1661031
化学式:
HfO2
分子量:
210.4888
MOL File:
Mol file

HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR) 物理性質

安全性情報

HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR) 価格

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HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR) 化学特性,用途語,生産方法

HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR) 上流と下流の製品情報

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HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR) 生産企業

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