| 英文名称 | 中文名称 | CAS | MF |
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TANSHINONE IIA SILATE
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TANSHINONE IIB
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丹参酮IIB
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C19H18O4
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Tantalum standard solution,for AAS,1 mg/ml Tain 5% HF
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Ta
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Tantalum(V) Chloride, Resublimed 99.999%
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Cl5Ta
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Tantalum Isopropoxide 99.9%
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C15H35O5Ta
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Tantalum (Ta) Standard Solution
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Tantalum (Ta) Standard Solution
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Ta
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Tantalum (Ta) in water with trace HF, 10 000 μg/mL
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TantaluM, plasMa standard solution, Specpure|r, Ta 10,000Dg/Ml
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钽,等离子标准溶液, SPECPURE, TA 10,000ΜG/ML
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Ta
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tantalum trichloride
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13569-67-0
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Cl3Ta
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tantalum tetrachloride
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13569-72-7
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Cl4Ta
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Tantalum hydroxide
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氢氧化钽
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37349-51-2
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HOTa-
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TANTALUM 10,000 PPM ICP STANDARD SOLUTION
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Ta
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TANTALUM WIRE, 0.127MM (0.005IN) DIA, 99.9% (METALS BASIS)
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Ta
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TANTALUM POWDER, -100 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM
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Ta
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TANTALUM INGOT
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Ta
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TANTALUM OXALATE
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C10O20Ta2
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TANTALUM SLUG, 3.175MM (0.125IN) DIA X 6.35MM (0.25IN) LENGTH, 99.95% (METALS BASIS)
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Ta
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TANTALUM SELENIDE
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硒化钽
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12039-55-3
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Se2Ta
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TANTALUM FOIL, 1.5MM (0.06IN) THICK, 99.95% (METALS BASIS)
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Ta
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TANTALUM DIETHYLAMIDE
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五(二乙氨基)钽
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C20H50N5Ta
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TANTALUM STANDARD SOLUTION, 1 MG/ML TA IN 5% HF, FOR AAS
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Ta
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TANTALUM STANDARD SOLUTION
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TANTALUM STANDARD SOLUTION
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Ta
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TANTALUM POWDER, -22 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM
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Ta
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TANTALUM FOIL, 0.25MM (0.01IN) THICK, ANNEALED, 99.95% (METALS BASIS)
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Ta
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TANTALUM FOIL, 0.7MM (0.03IN) THICK, 99.9% (METALS BASIS)
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Ta
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TANTALUM(V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
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O5Ta2
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TANTALUM BOAT, THICKNESS (MM), 0.05, LENGTH (MM), 75
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钽舟
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TANTALUM PENTA-N-PROPOXIDE
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C15H35O5Ta
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TantalumPentoxid
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TantalumRods,99.9%
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744-25-7
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TantalumTarget
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TANTALUM PENTAFLUORIDE
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五氟化钽
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7783-71-3
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F5Ta
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TANTALUM - 5% HNO3 + 2% HF 500ML
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Ta
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TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
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O5Ta2
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TANTALUM, PLASMA STANDARD SOLUTION, SPECPURE®, TA 10,000µG/ML
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Ta
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TANTALUM POWDER, APS <2 MICRON, 99.9% (METALS BASIS)
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Ta
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TANTALUM GAUZE, 30 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE
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Ta
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TANTALUM NITRIDE
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氮化钽
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12033-62-4
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NTa
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TANTALUM WIRE, 1.0MM (0.04IN) DIA, ANNEALED, 99.95% (METALS BASIS)
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Ta
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TANTALUM BORIDE
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二硼化钽
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12007-35-1
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B2Ta
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Tantalum pentoxide
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氧化钽
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1314-61-0
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O5Ta2
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TantalumAndTitaniumRod,Sheet,Plate
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TANTALUM PELLET, 1MM (0.04IN) DIA X 2MM (0.08IN), 99.9% (METALS BASIS)
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Ta
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TANTALUM (V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3
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O5Ta2
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Tantalum ICP-MS Standard
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Tantal(V)nitrid
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12033-94-2
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TANTALUM (V) ISOPROPOXIDE
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五异丙氧基钽
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16761-83-4
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C15H35O5Ta
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TANTALUM TUBING 10MM O.D. X 0.5MM WALL
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Ta
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TANTALUM SLUG, 3.175MM (0.125IN) DIA X 3.175MM (0.125IN) LENGTH, 99.95% (METALS BASIS)
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Ta
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Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
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碳化钽溅射靶
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Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
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氧化钽溅射靶
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O5Ta2
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tantalus protein
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tantalum oxide
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59763-75-6
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TANTALUMPLASMAEMISSIONSTANDARD,1ML=10MGTA
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Tantalum carbide
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碳化钽
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12070-06-3
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CTa
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Tantalum sulfide
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二硫化钽
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12143-72-5
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S2Ta
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Tantalum(V) bromide
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Br5Ta
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tantalite
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O2Ta-
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TANTALUM (V) IODIDE
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碘化钽
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14693-81-3
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I5Ta
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TANTALUM NITRATE
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N5O15Ta
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TANTALUM PENTA-I-BUTOXIDE
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C20H45O5Ta
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TANTALUM(V) TETRAETHOXIDE 2,4-PENTANEDIONATE
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四乙醇乙酰丙酮钽
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20219-33-4
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C13H27O6Ta
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TANTALUM ALUMINUM-I-PROPOXIDE
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C24H56AlO8Ta
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TANTALUM(V) TETRAETHOXYDIMETHYLAMIDOETHOXIDE/ 99.99%
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C60H115N10O35Ta
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Tantalum(v)chlorideanhydrous(99.9%-ta)
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TANTALUM GAUZE, 50 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE
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Ta
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TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
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O5Ta2
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TANTALUM - 5% HNO3 + 2% HF 250ML
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Ta
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tantalum(5+) oxalate
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31791-37-4
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C10O20Ta2
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TANTALUM FOIL, 1.0MM (0.04IN) THICK, 99.95% (METALS BASIS)
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Ta
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TANTALUM SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.95% (METALS BASIS EXCLUDING NB)
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Ta
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TANTALUM (V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6
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O5Ta2
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TANTALUM 1,000 PPM ICP STANDARD SOLUTION
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Ta
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TANTALUM WIRE, 0.5MM (0.02IN) DIA, ANNEALED, 99.95% (METALS BASIS)
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Ta
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Tantalum boride
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12653-85-9
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TANTALUM (V) ISOPROPOXIDE, 10% W/V IN ISOPROPANOL/HEXANE, 99
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TantaliumStandardSolutian
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鉭標準液
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TANTALUMPLASMAEMISSIONSTANDARD,1ML=1MGTA
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TANTALUM (V) (TETRAETHOXY)[BREW]
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TANTALUM PENTA-T-BUTOXIDE
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C20H45O5Ta
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TANTALUM WIRE, 0.25MM (0.01IN) DIA, ANNEALED, 99.9+% (METALS BASIS)
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Ta
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Tantalum(V) Chloride, Resublimed
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Cl5Ta
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TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE
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三氟乙醇钽
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13053-54-8
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C2H3F3OTa
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TANTALUM BORIDE
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硼化钽
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12007-07-7
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BTa
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TANTALUM(V) METHOXIDE
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甲醇钽
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865-35-0
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C5H15O5Ta
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TANTALUM PENTA PHENOXIDE
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C30H25O5Ta
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TANTALUM PENTA-SEC-BUTOXIDE
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C20H45O5Ta
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TANTALUM ALUMINIDE
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铝化钽
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12004-76-1
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AlH3Ta
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TANTALUM CARBIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.1
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TANTALUM(V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
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O5Ta2
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Tantalum(V) oxide
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1314-61-0
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O5Ta2
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TANTALUM (V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6
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O5Ta2
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TANTALUM (V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3
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O5Ta2
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TANTALUM (V) BROMIDE
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五溴化钽
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13451-11-1
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Br5Ta
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TANTALUM HYDRIDE
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氢化钽
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13981-95-8
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HTa
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Tantalate ion(-1)
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O3Ta-1
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Tantalum nitride
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N5Ta3
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Tantalum(V) fluoride
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7783-71-3
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F5Ta
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TANTALUM ROD, 2.8MM (0.11IN) DIA, 99.95% (METALS BASIS)
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Ta
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Tantalum(V)chlorideresublimed(99.-ta)spectro
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Ta+5
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