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TANSHINONE IIA SILATE
丹参酮IIB
Tantalum standard solution,for AAS,1 mg/ml Tain 5% HF
Tantalum(V) Chloride, Resublimed 99.999%
Tantalum Isopropoxide 99.9%
Tantalum (Ta) Standard Solution
Tantalum (Ta) in water with trace HF, 10 000 μg/mL
钽,等离子标准溶液, SPECPURE, TA 10,000ΜG/ML
13569-67-0
tantalum trichloride
13569-72-7
tantalum tetrachloride
37349-51-2
氢氧化钽
TANTALUM 10,000 PPM ICP STANDARD SOLUTION
TANTALUM WIRE, 0.127MM (0.005IN) DIA, 99.9% (METALS BASIS)
TANTALUM POWDER, -100 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM
TANTALUM INGOT
TANTALUM OXALATE
TANTALUM SLUG, 3.175MM (0.125IN) DIA X 6.35MM (0.25IN) LENGTH, 99.95% (METALS BASIS)
12039-55-3
硒化钽
TANTALUM FOIL, 1.5MM (0.06IN) THICK, 99.95% (METALS BASIS)
五(二乙氨基)钽
TANTALUM STANDARD SOLUTION, 1 MG/ML TA IN 5% HF, FOR AAS
TANTALUM STANDARD SOLUTION
TANTALUM POWDER, -22 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM
TANTALUM FOIL, 0.25MM (0.01IN) THICK, ANNEALED, 99.95% (METALS BASIS)
TANTALUM FOIL, 0.7MM (0.03IN) THICK, 99.9% (METALS BASIS)
TANTALUM(V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
钽舟
TANTALUM PENTA-N-PROPOXIDE
TantalumPentoxid
744-25-7
TantalumRods,99.9%
TantalumTarget
7783-71-3
五氟化钽
TANTALUM - 5% HNO3 + 2% HF 500ML
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
TANTALUM, PLASMA STANDARD SOLUTION, SPECPURE®, TA 10,000µG/ML
TANTALUM POWDER, APS <2 MICRON, 99.9% (METALS BASIS)
TANTALUM GAUZE, 30 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE
12033-62-4
氮化钽
TANTALUM WIRE, 1.0MM (0.04IN) DIA, ANNEALED, 99.95% (METALS BASIS)
12007-35-1
二硼化钽
1314-61-0
氧化钽
TantalumAndTitaniumRod,Sheet,Plate
TANTALUM PELLET, 1MM (0.04IN) DIA X 2MM (0.08IN), 99.9% (METALS BASIS)
TANTALUM (V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3
Tantalum ICP-MS Standard
12033-94-2
Tantal(V)nitrid
16761-83-4
五异丙氧基钽
TANTALUM TUBING 10MM O.D. X 0.5MM WALL
TANTALUM SLUG, 3.175MM (0.125IN) DIA X 3.175MM (0.125IN) LENGTH, 99.95% (METALS BASIS)
碳化钽溅射靶
氧化钽溅射靶
tantalus protein
59763-75-6
氧化钽
TANTALUMPLASMAEMISSIONSTANDARD,1ML=10MGTA
12070-06-3
碳化钽
12143-72-5
二硫化钽
Tantalum(V) bromide
tantalite
14693-81-3
碘化钽
TANTALUM NITRATE
TANTALUM PENTA-I-BUTOXIDE
20219-33-4
四乙醇乙酰丙酮钽
TANTALUM ALUMINUM-I-PROPOXIDE
TANTALUM(V) TETRAETHOXYDIMETHYLAMIDOETHOXIDE/ 99.99%
Tantalum(v)chlorideanhydrous(99.9%-ta)
TANTALUM GAUZE, 50 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
TANTALUM - 5% HNO3 + 2% HF 250ML
31791-37-4
tantalum(5+) oxalate
TANTALUM FOIL, 1.0MM (0.04IN) THICK, 99.95% (METALS BASIS)
TANTALUM SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.95% (METALS BASIS EXCLUDING NB)
TANTALUM (V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6
TANTALUM 1,000 PPM ICP STANDARD SOLUTION
TANTALUM WIRE, 0.5MM (0.02IN) DIA, ANNEALED, 99.95% (METALS BASIS)
12653-85-9
Tantalum boride
TANTALUM (V) ISOPROPOXIDE, 10% W/V IN ISOPROPANOL/HEXANE, 99
鉭標準液
TANTALUMPLASMAEMISSIONSTANDARD,1ML=1MGTA
TANTALUM (V) (TETRAETHOXY)[BREW]
TANTALUM PENTA-T-BUTOXIDE
TANTALUM WIRE, 0.25MM (0.01IN) DIA, ANNEALED, 99.9+% (METALS BASIS)
Tantalum(V) Chloride, Resublimed
13053-54-8
三氟乙醇钽
12007-07-7
硼化钽
865-35-0
甲醇钽
TANTALUM PENTA PHENOXIDE
TANTALUM PENTA-SEC-BUTOXIDE
12004-76-1
铝化钽
TANTALUM CARBIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.1
TANTALUM(V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
1314-61-0
Tantalum(V) oxide
TANTALUM (V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6
TANTALUM (V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3
13451-11-1
五溴化钽
13981-95-8
氢化钽
Tantalate ion(-1)
Tantalum nitride
7783-71-3
Tantalum(V) fluoride
TANTALUM ROD, 2.8MM (0.11IN) DIA, 99.95% (METALS BASIS)
Tantalum(V)chlorideresublimed(99.-ta)spectro
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