N,N-二硅烷基-硅烷胺(13862-16-3)核磁图(1HNMR)
InChI:InChI=1S/H9NSi3/c2-1(3)4/h2-4H3
InChIKey: VOSJXMPCFODQAR-UHFFFAOYSA-N
Smiles:[SiH3]N([SiH3])[SiH3]
parameter in CCl4
parameter in benzene
parameter in CHCl3
-
| 1H NMR |
300 MHz |
| H9 N Si3
|
10 % in CCl4
|
| 2-silyldisilazane
|
 |
Parameter ppm Hz
D(A) 4.43
ROCKTAESCHEL,G. ET AL. Z.NATURFORSCH. 23 B, 598 (1968)
J(A,SI-29):-213.9HZ. J(A,N-15):4.42HZ.
|
Hz ppm Int.
1329.00 4.430 1000
-
| 1H NMR |
300 MHz |
| H9 N Si3
|
10 % in benzene
|
| 2-silyldisilazane
|
|
Parameter ppm Hz
D(A) 4.35
ROCKTAESCHEL,G. ET AL. Z.NATURFORSCH. 23 B, 598 (1968)
J(A,SI-29):-213.9HZ.
|
Hz ppm Int.
1305.00 4.350 1000
-
| 1H NMR |
300 MHz |
| H9 N Si3
|
10 % in CHCl3
|
| 2-silyldisilazane
|
|
Parameter ppm Hz
D(A) 4.41
ROCKTAESCHEL,G. ET AL. Z.NATURFORSCH. 23 B, 598 (1968)
J(A,SI-29):-213.9HZ. J(A,N-15):4.43HZ.
|
Hz ppm Int.
1323.00 4.410 1000