| Identification | Back Directory | [Name]
1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane | [CAS]
17955-67-8 | [Synonyms]
1,1,3,3,5,5-Hexaethoxy-1,3,5-Trisilinane
1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane | [Molecular Formula]
C15H36O6Si3 | [MDL Number]
MFCD06660097 | [MOL File]
17955-67-8.mol | [Molecular Weight]
396.7 |
| Chemical Properties | Back Directory | [Boiling point ]
133°C/5mmHg(lit.) | [density ]
1.0512 | [refractive index ]
1.4360 to 1.4400 | [form ]
clear liquid | [color ]
Colorless to Almost colorless | [Specific Gravity]
1.0152 | [Hydrolytic Sensitivity]
7: reacts slowly with moisture/water | [InChI]
InChI=1S/C15H36O6Si3/c1-7-16-22(17-8-2)13-23(18-9-3,19-10-4)15-24(14-22,20-11-5)21-12-6/h7-15H2,1-6H3 | [InChIKey]
SPEDTQCGQOZHQP-UHFFFAOYSA-N | [SMILES]
[Si]1(OCC)(OCC)C[Si](OCC)(OCC)C[Si](OCC)(OCC)C1 |
| Hazard Information | Back Directory | [Uses]
1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane is a known organosilane building block that can be used to synthesize PMO thin films[1] and EMA-2 materials[2]. PMO thin films can be used as one of the candidate materials for ultra-low-k dielectrics in microelectronic devices. Studies have shown that this building block is stable in acidic gels, but gradually opens when the gelation temperature and time exceed the "standard" conditions used for alkaline gels. | [References]
[1] F. GOETHALS. Ultra-low-k cyclic carbon-bridged PMO films with a high chemical resistance[J]. Journal of Materials Chemistry B, 2012, 77 1: 8281-8286. DOI:10.1039/C2JM30312D.
[2] QUANCHANG LI. Template-Free Self-Assembly of Mesoporous Organosilicas[J]. Chemistry of Materials, 2018, 30 7: 2218-2228. DOI:10.1021/acs.chemmater.7b04480.
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