ChemicalBook--->CAS DataBase List--->3385-78-2

3385-78-2

3385-78-2 Structure

3385-78-2 Structure
IdentificationBack Directory
[Name]

TRIMETHYLINDIUM
[CAS]

3385-78-2
[Synonyms]

Trimethlindium
TRIMETHYLINDIUM
trimethylindigane
Indium, trimethyl-
TRIMETHYLINDIUM (99.9%IN)
Trimethylindiumelecgrwhitextl
Trimethylindium,98+%(99.9+%-In)
Trimethylindium,elec.gr.(99.999%-In)PURATREM
TRIMETHYL INDIUM, TYPE C BUBBLER, BOTTOM DIA. 50.8MM DIA.
Trimethylindium, 98+% (99.9+%-In) (Can be packaged in cyl or ampoule)
Trimethylindium, elec. gr. (99.999%-In) PURATREM **S STEEL CYL EXTRA** **Can be ampouled**
TriMethylindiuM, elec. gr. (99.999%-In) PURATREM, 98-2010, contained in 50 Ml electropolished Swagelok cylinder (96-1077) for CVD/ALD
Trimethylindium, elec. gr. (99.999%-In) PURATREM, 98-2010, contained in 50 ml electropolished Swagelok(R) cylinder (96-1077) for CVD/ALD
[EINECS(EC#)]

222-200-9
[Molecular Formula]

C3H9In
[MDL Number]

MFCD00014846
[MOL File]

3385-78-2.mol
[Molecular Weight]

159.92
Chemical PropertiesBack Directory
[Melting point ]

88°C
[Boiling point ]

135.7°C
[density ]

1,568 g/cm3
[Fp ]

-18°C
[form ]

crystal
[color ]

white
[Sensitive ]

heat sensitive, moisture sensitive, store cold
Safety DataBack Directory
[Risk Statements ]

14-17-34
[Safety Statements ]

7-16-43-45
[RIDADR ]

2845
[TSCA ]

Yes
[REACH Registrations]

Inactive
[HazardClass ]

4.2
[PackingGroup ]

I
Questions And AnswerBack Directory
[Properties]

WARNING Trimethylindium may undergo rapid thermal decomposition if exposed to temperatures above 100°C. Never attempt to distill the material at atmospheric pressure.
[Application]

Trimethylindium is used as a high-quality solid indium source for semiconductor compound deposition in high-performance and high-efficiency solar cells such as light-emitting diodes, laser diodes, and transistors.
Hazard InformationBack Directory
[Synthesis]

In a reactor filled with inert gas, the raw material of indium-magnesium alloy was put into the reactor, in the presence of ether solvent, the halothane was added gradually under stirring condition, and the solvent reflux rate was controlled by controllin
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