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ChemicalBook >> LITHIUM TANTALUM ETHOXIDE

LITHIUM TANTALUM ETHOXIDE

LITHIUM TANTALUM ETHOXIDE price.
  • $246
  • Product name: LITHIUM TANTALUM ETHOXIDE
  • CAS: 127503-04-2
  • MF: C12H30LiO6Ta
  • MW: 458.25
  • EINECS:
  • MDL Number:MFCD00210630
  • Synonyms:LITHIUM TANTALUM ETHOXIDE;Lithium tantalum ethoxide, 99.9% (metals basis), 5% w/v in ethanol;Lithium tantalum ethoxide, 5% w/v in ethanol, 99.9% (metals basis);Lithium tantalum ethoxide, 99.9% (metals basis), 5% w/v in e
1 prices
Selected condition:
Brand
  • Alfa Aesar
Package
  • 100ml
  • ManufacturerAlfa Aesar
  • Product number042344
  • Product descriptionLithium tantalum ethoxide, 99.9% (metals basis), 5% w/v in ethanol
  • Packaging100ml
  • Price$246
  • Updated2021-12-16
  • Buy
Manufacturer Product number Product description Packaging Price Updated Buy
Alfa Aesar 042344 Lithium tantalum ethoxide, 99.9% (metals basis), 5% w/v in ethanol 100ml $246 2021-12-16 Buy

Properties

Boiling point :230°C/0.2mm
Flash point :230°C/0.2mm
form :Liquid
color :Pale yellow
Water Solubility :Decomposes in water.
Sensitive :Moisture Sensitive
Exposure limits :ACGIH: STEL 1000 ppm
OSHA: TWA 1000 ppm(1900 mg/m3)
NIOSH: IDLH 3300 ppm; TWA 1000 ppm(1900 mg/m3)

Safety Information

Symbol(GHS): GHS hazard pictograms
Signal word:
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
H225 Highly Flammable liquid and vapour Flammable liquids Category 2 Danger GHS hazard pictograms P210,P233, P240, P241, P242, P243,P280, P303+ P361+P353, P370+P378,P403+P235, P501
Precautionary statements:
P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking.
P240 Ground/bond container and receiving equipment.
P241 Use explosion-proof electrical/ventilating/lighting/…/equipment.
P303+P361+P353 IF ON SKIN (or hair): Remove/Take off Immediately all contaminated clothing. Rinse SKIN with water/shower.

Description

Lithium tantalum ethoxide is a precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods.

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