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(Trifluoromethyl)trimethylsilane

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CAS:81290-20-2
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(Trifluoromethyl)trimethylsilane Basic information
Product Name:(Trifluoromethyl)trimethylsilane
Synonyms:TriMethyl(trifluoroMethyl)silane solution 0.5 M in THF;(TrifluoroMethyl)triMethylsilane SynonyMs TriMethyl(trifluoroMethyl)silane;(Trimethylsilyl)trifluoromethane Ruppert-Prakash Reagent;Reagents, Ruppert's;TriMethylsilyl(trifluoroMethyl)silane;TriMethyl(trifluoroMethyl)sila;TriMethyl(trifluoroMethyl)silane 99%;TriMethyl(trifluoroMethyl)silane solution ~2.0 M in THF
CAS:81290-20-2
MF:C4H9F3Si
MW:142.2
EINECS:
Product Categories:C-C Bond Formation;organosilicon compounds;Fluorinated Building Blocks;Fluorinating Reagents & Building Blocks for Fluorinated Biochemical Compounds;Si (Classes of Silicon Compounds);Si-(C)4 Compounds;Silicon Compounds (for Synthesis);Synthetic Organic Chemistry;Chemical Synthesis;Fluorination Reagents;Organometallic Reagents;Organosilicon;Others;Ruppert's Reagent;Synthetic Reagents;Trifluoromethylation
Mol File:81290-20-2.mol
(Trifluoromethyl)trimethylsilane Structure
(Trifluoromethyl)trimethylsilane Chemical Properties
Boiling point 54-55 °C (lit.)
density 0.962 g/mL at 20 °C (lit.)
vapor pressure 10.98 psi ( 55 °C)
refractive index n20/D 1.386
Fp 14 °F
storage temp. 2-8°C
solubility sol THF, ether, CH2Cl2.
form Liquid
Specific Gravity0.962
color Clear colorless
Water Solubility Soluble in alcohol, THF, ether, dichloromethane, aromatic and aliphatic hydrocarbons. Soluble in water(with white smokes).
Sensitive Moisture Sensitive
Hydrolytic Sensitivity4: no reaction with water under neutral conditions
Merck 14,9683
BRN 4241868
Exposure limitsACGIH: TWA 50 ppm; STEL 100 ppm (Skin)
OSHA: TWA 200 ppm(590 mg/m3)
NIOSH: IDLH 2000 ppm; TWA 200 ppm(590 mg/m3); STEL 250 ppm(735 mg/m3)
Stability:Volatile
InChI1S/C4H9F3Si/c1-8(2,3)4(5,6)7/h1-3H3
InChIKeyMWKJTNBSKNUMFN-UHFFFAOYSA-N
SMILESC[Si](C)(C)C(F)(F)F
CAS DataBase Reference81290-20-2(CAS DataBase Reference)
Safety Information
Hazard Codes F,Xi,Xn
Risk Statements 11-36/37-19-36/37/38-22-40-14
Safety Statements 16-33-39-26-36-29-36/37
RIDADR UN 1993 3/PG 2
WGK Germany 3
10-21
Hazard Note Flammable
TSCA No
HazardClass 3
PackingGroup II
HS Code 29319090
Storage Class4.3 - Hazardous materials which set free flammable gases upon contact with water
Hazard ClassificationsFlam. Liq. 2
Water-react 2
MSDS Information
ProviderLanguage
ACROS English
SigmaAldrich English
ALFA English
(Trifluoromethyl)trimethylsilane Usage And Synthesis
Chemical Properties(Trifluoromethyl)trimethylsilane (TMSCF3) is a flammable colorless liquid with a boiling point of 54–55 °C, a flash point of –17 °C and density of 0.926 g/mL at 20 °C. It is a trifluoromethylation reagent used in nucleophilic addition reactions of aldehydes and ketones. It may be harmful if inhaled, swallowed, absorbed through skin and may cause respiratory tract, skin and eye irritation. TMSCF3 was firstly synthesized by Rupert in 1984 via the condensation reaction of CF3Br and TMSCl with (Et2N)3P.
UsesSilicon-based fluorinating reagents for the efficient trifluoromethylation of carbonyls and ethylene diamines. Precursors used for metal-mediated trifluoromethylation of aromatic, heteroaromatic, vinyl substrates, etc.
UsesTMSCF3 is versatile reagent for trifluoromethylation, such as transition-metal-catalyzed reaction, miscellaneous trifluoromethylation, and addition to carbonyl and imine groups. These reactions are extremely useful approaches in the pharmaceutical and agrochemical industry, because they enhance metabolic stability (metabolic blocking) and alter the compound properties (liphophilicity, binding selectivity).
Preparation(Trifluoromethyl)trimethylsilane is prepared from trimethylsilyl chloride and bromotrifluoromethane in the presence of a phosphorus(III) reagent that serves as a halogen acceptor.
General DescriptionTrimethyl(trifluoromethyl)silane (TMSCF3) is also called as Ruppert-Prakash fluorination reagent. It is extensively used for the synthesis of trifluoromethyl-containing compounds.
reaction suitabilityreaction type: C-C Bond Formation
Toxicology(Trifluoromethyl)trimethylsilane is classified as toxic and requires careful handling and safety protocols to minimize human exposure. Prolonged or repeated exposure can lead to various health problems such as skin, eye, and respiratory irritation.
Synthesis
Chlorotrimethylsilane

75-77-4

Trifluoromethane

75-46-7

(Trifluoromethyl)trimethylsilane

81290-20-2

160 g of anhydrous toluene and 19.5 g (0.5 mol) of potassium metal were added to a 1000 mL three-necked flask and the apparatus was protected by argon. The temperature was raised to 55 °C, followed by the dropwise addition of a mixture of 104 g (1 mol) styrene and 161 g (1 mol) hexamethyldisilazane over about 30 minutes. The reaction was maintained for 2 hours until the potassium metal was completely dissolved and then cooled to room temperature to obtain a reaction solution. The reaction solution was cooled to -85 °C and maintained for 20 minutes. 81 g (0.75 mol) of trimethylchlorosilane was slowly added dropwise. Subsequently, trifluoromethane was passed into the reaction system and stopped when 35 g (0.5 mol) of trifluoromethane was passed. The reaction mixture was kept at -85°C for 1 hour and then slowly warmed up to room temperature. The reaction mixture was washed twice with water to ensure that all solids were dissolved and left to stratify. The organic layer was separated and distilled to give a final 64 g (88% yield) of trifluoromethyltrimethylsilane.

Purification MethodsPurify it by distilling it from trap to trap in a vacuum of 20mm using a bath at 45o and Dry-ice/Me2CO bath for the trap. The liquid in the trap is then washed with ice cold H2O (3x), the top layer is collected, dried (Na2SO4), and the liquid is decanted and fractionated through a helices-packed column at atmospheric pressure. 1H, 1 3C, 1 9F, and 2 9Si NMR can be used for assessing the purity of fractions. [Ruppert et al. Tetrahedron Lett 25 2195 1984, Krishnamurti et al. J Org Chem 56 984 199, Beilstein 4 IV 3892.]
References[1] Patent: CN106117258, 2016, A. Location in patent: Paragraph 0024; 0025; 0026; 0027; 0028; 0029-0035
[2] Science, 2012, vol. 338, # 6112, p. 1324 - 1327
[3] Patent: US2014/66640, 2014, A1. Location in patent: Paragraph 0057
[4] Patent: WO2017/223406, 2017, A1. Location in patent: Paragraph 00157; 00159; 00160
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