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| | TANTALUM SILICIDE Basic information |
| Product Name: | TANTALUM SILICIDE | | Synonyms: | TANTALUM SILICIDE;pentatantalum trisilicide;TANTALUM SILICIDE, 99.5% (METALS BASIS EXCLUDING NB), NB 0.1;Tantalumsilicide,99.5%(metalsbasisexcludingNb),Nb0.1-1%;Einecs 235-081-3;silicon,tantalum;Nickel Chromium (Ni-Cr) Alloy Sputtering Targets | | CAS: | 12067-56-0 | | MF: | H4SiTa | | MW: | 213.06 | | EINECS: | 235-081-3 | | Product Categories: | | | Mol File: | 12067-56-0.mol |  |
| | TANTALUM SILICIDE Chemical Properties |
| Melting point | 2499 ℃ | | density | 13,060 (ρ/kg.m–3) | | Crystal Structure | Hexagonal | | Stability: | The compound is thermally stable in air up to 400°C | | EPA Substance Registry System | Tantalum silicide (Ta5Si3) (12067-56-0) |
| Provider | Language |
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ALFA
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| | TANTALUM SILICIDE Usage And Synthesis |
| Chemical Properties | -325 mesh powder(s); used as a 99.5 or 99.95% material as a sputtering target in the fabrication of integrated circuits [ALF93] [CER91] |
| | TANTALUM SILICIDE Preparation Products And Raw materials |
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