HAFNIUM SILICIDE manufacturers
- HafniuM silicide
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- $1.00 / 1KG
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2020-05-19
- CAS: 12401-56-8
- Min. Order: 1KG
- Purity: 99%
- Supply Ability: 20T
- HAFNIUM SILICIDE
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- $1.00 / 1KG
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2019-09-02
- CAS:12401-56-8
- Min. Order: 1KG
- Purity: 85.0-99.8%
- Supply Ability: 200kg
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| HAFNIUM SILICIDE Basic information |
Product Name: | HAFNIUM SILICIDE | Synonyms: | HAFNIUM SILICIDE;HAFNIUM (IV) SILICIDE;hafniumsilicide(hfsi2);Hafniumsilicidemeshgraypowder;hafnium disilicide;HAFNIUM (IV) SILICIDE 99%;um 99.8%Hafnium silicide;HAFNIUM SILICIDE ISO 9001:2015 REACH | CAS: | 12401-56-8 | MF: | HfSi2 | MW: | 234.66 | EINECS: | 235-640-1 | Product Categories: | | Mol File: | 12401-56-8.mol | |
| HAFNIUM SILICIDE Chemical Properties |
Melting point | 1680°C | density | 8,02 g/cm3 | form | Powder | color | gray orthorhombic crystals, crystalline | Water Solubility | it is insoluble in water. | Crystal Structure | Orthorhombic | Exposure limits | ACGIH: TWA 0.5 mg/m3 NIOSH: IDLH 50 mg/m3; TWA 0.5 mg/m3 | EPA Substance Registry System | Hafnium silicide (HfSi2) (12401-56-8) |
Provider | Language |
ALFA
| English |
| HAFNIUM SILICIDE Usage And Synthesis |
Chemical Properties | gray powder(s); rhomb, a=0.3677nm, b=1.455nm, c=0.3649nm; hardness 930 kgf/mm2; as 99.5% pure material, used as sputtering target to produce wear-resistant films and semiconducting films for use in integrated circuits [KIR80] [STR93] [CER91] | Uses | They have been used as ohmic contacts, Schottky barrier contacts, gate electrodes, local interconnects, and diffusion barriers. FeSi2 has become the remarkable source as high temperature thermoelectric material. It is also used as a powder in ceramic materials. |
| HAFNIUM SILICIDE Preparation Products And Raw materials |
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