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| TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Basic information | Uses |
| TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Chemical Properties |
Melting point | 104-105.5 °C(lit.) | Boiling point | 55.7 °C760 mm Hg | Fp | 56 °C | form | crystal | color | white | Water Solubility | Miscible with Water. | Sensitive | Moisture Sensitive |
| TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Usage And Synthesis |
Uses | Tris(dimethylamido)gallium(III) can be used in the following fields:
- Reagent used for the growth of gallium oxide films via the reaction with alcohols or water.
- Complex used for the ALD of gallium oxide films.
- Complex used in a new pyrolysis route to GaN quantum dots.
- Complex used for the generation of monodispersed, colloidal gallium nanoparticles.
- Complex used for the atomic layer deposition of gallium sulfide films.
| Uses | Gallium nitride film precursor. Used as Reagent. | General Description | Atomic number of base material: 31 Gallium |
| TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Preparation Products And Raw materials |
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