| Identification | Back Directory | [Name]
TRIS(DIMETHYLAMINO)SILANE | [CAS]
15112-89-7 | [Synonyms]
TDMAS
3DMAS
LS 1460
amino)siL
(Me2N)3SiH
3DMAS : [(CH3)2N]3SiH
Tri(dimethylamino)silane
Tris(dimethyamino)silane
Tris(dimethylamido)silane
TRIS(DIMETHYLAMINO)SILANE
TRIS(DIMETHYLAMINO)SILANE 99+%
Tris(dimethylamino)silane Liquid
Tris(dimethylamino)silane 3DMAS
TRIS(DIMETHYLAMINO)SILANE, 99.9+%
Tris(dimethylamino)silane, 99+% 3DMAS
N,N',N''-Silanetriyltris(dimethylamine)
N,N',N''-(Silanetriyl)tris(dimethylamine)
n,n,n’,n’,n’’,n’’-hexamethyl-silanetriamin
n,n,n’,n’,n’’,n’’-hexamethylsilanetriamine
N,N,N’,N’,N’’,N’’-hexamethyl-Silanetriamine
TRIS(DIMETHYLAMINO)SILANE ISO 9001：2015 REACH
Silanetriamine, N,N,N',N',N'',N''-hexamethyl-
Tris(dimethylamino)silane electronic grade, 99.999%
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM
Tris(dimethylamino)silane packaged for use in deposition systems
Tris(diMethylaMino)silane, 99+%, 14-8750, contained in 50 Ml Swagelok cylinder (96-1070) for CVD/ALD
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok cylinder (96-1070) for CVD/ALD
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD
N,N,N',N',N'',N''-hexamethyl-Silanetriamine tris(Dimethylamino)silane n,n,n',n',n'',n''-hexamethylsilanetriamine n,n,n',n',n'',n''-hexamethyl-silanetriamin Silanetriamine,N,N,N',N',N'',N''-hexamethyl- | [EINECS(EC#)]
239-165-0 | [Molecular Formula]
C6H19N3Si | [MDL Number]
MFCD00048006 | [MOL File]
15112-89-7.mol | [Molecular Weight]
161.32 |
| Chemical Properties | Back Directory | [Melting point ]
<0°C | [Boiling point ]
145 °C | [density ]
0,838 g/cm3 | [refractive index ]
1.4247 | [Fp ]
25°C | [storage temp. ]
2-8°C, protect from light | [form ]
liquid | [pka]
10.93±0.70(Predicted) | [color ]
colorless to light yellow | [Specific Gravity]
0.84 | [Hydrolytic Sensitivity]
8: reacts rapidly with moisture, water, protic solvents | [Sensitive ]
air sensitive, moisture sensitive | [InChI]
1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3 | [InChIKey]
TWVSWDVJBJKDAA-UHFFFAOYSA-N | [SMILES]
CN(C)[SiH](N(C)C)N(C)C | [EPA Substance Registry System]
N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7) |
| Safety Data | Back Directory | [Hazard Codes ]
F,C | [Risk Statements ]
10-36/37/38-52/53-34-29-20-15-11 | [Safety Statements ]
16-26-36/37/39-45-43 | [RIDADR ]
1993 | [WGK Germany ]
3 | [RTECS ]
VV5800000 | [TSCA ]
Yes | [REACH Registrations]
Active | [Storage Class]
4.3 - Hazardous materials which set free flammable gases upon contact with water | [Hazard Classifications]
Acute Tox. 3 Dermal
Acute Tox. 3 Inhalation
Acute Tox. 4 Oral
Eye Dam. 1
Flam. Liq. 2
Skin Corr. 1B
Water-react 2 | [Toxicity]
rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989. |
| Hazard Information | Back Directory | [Uses]
Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor. | [General Description]
Please inquire for quantity, pricing, and packaging options. | [reaction suitability]
reagent type: reductant | [Synthesis]
A method for preparing tris(dimethylamino)silane, comprising the steps of: adding dimethylamine and a hydrocarbon solvent to a reactor under the protection of an inert atmosphere, and then adding an organolithium compound to the system to produce a lithiu |
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