| Identification | More | [Name]
1,1,3,3-TETRAMETHYLDISILAZANE | [CAS]
15933-59-2 | [Synonyms]
1,1,3,3-TETRAMETHYLDISILAZANE
TETRAMETHYLDISILAZANE
TMDS
Bis(dimethylsilyl)amine
Bisdimethylsilylamine
Disilazane, 1,1,3,3-tetramethyl-
N-(Dimethylsilyl)(dimethyl)silanamine
n-(dimethylsilyl)-1,1-dimethyl-silanamin
N-(dimethylsilyl)-1,1-dimethyl-Silanamine
Silanamine, N-(dimethylsilyl)-1,1-dimethyl-
N-(dimethylsilyl)-1,1-dimethylsilylamine
TETRAMETHYLDISILAZANE 98+%
1,1,3,3-Tetramethyl-2-azatrisilane
1,1,3,3-Tetramethylpropanedisilazane
Bis(dimethylsilyl) imide
Iminobis(dimethylsilane)
N-(Dimethylsilyl)dimethylsilylamine | [EINECS(EC#)]
240-072-2 | [Molecular Formula]
C4H15NSi2 | [MDL Number]
MFCD00025626 | [Molecular Weight]
133.34 | [MOL File]
15933-59-2.mol |
| Chemical Properties | Back Directory | [Appearance]
Clear colorless to faintly yellow liquid | [Melting point ]
99-100 °C
| [Boiling point ]
99-100 °C
| [density ]
0.752 g/mL at 25 °C(lit.)
| [refractive index ]
n20/D 1.404(lit.)
| [Fp ]
17 °F
| [storage temp. ]
Store below +30°C. | [solubility ]
Miscible with common organic solvents. | [form ]
clear liquid | [pka]
9.80±0.70(Predicted) | [color ]
Colorless to Almost colorless | [Specific Gravity]
0.752 | [Hydrolytic Sensitivity]
7: reacts slowly with moisture/water | [Sensitive ]
Moisture Sensitive | [BRN ]
741869 | [InChI]
1S/C4H15NSi2/c1-6(2)5-7(3)4/h5-7H,1-4H3 | [InChIKey]
NQCZAYQXPJEPDS-UHFFFAOYSA-N | [SMILES]
[H][Si](C)(C)N[Si]([H])(C)C | [CAS DataBase Reference]
15933-59-2(CAS DataBase Reference) | [EPA Substance Registry System]
Silanamine, N-(dimethylsilyl)-1,1-dimethyl- (15933-59-2) |
| Safety Data | Back Directory | [Symbol(GHS) ]
 
GHS02,GHS07 | [Signal word ]
Danger | [Hazard statements ]
H225-H315-H319-H335 | [Precautionary statements ]
P210-P302+P352-P305+P351+P338 | [Hazard Codes ]
F,Xi | [Risk Statements ]
R11:Highly Flammable.
R36/37/38:Irritating to eyes, respiratory system and skin . | [Safety Statements ]
S16:Keep away from sources of ignition-No smoking .
S26:In case of contact with eyes, rinse immediately with plenty of water and seek medical advice .
S36:Wear suitable protective clothing . | [RIDADR ]
UN 2924 3/PG 2
| [WGK Germany ]
3
| [F ]
10-21 | [TSCA ]
Yes | [HazardClass ]
3 | [PackingGroup ]
II | [HS Code ]
29319090 | [Storage Class]
3 - Flammable liquids | [Hazard Classifications]
Eye Irrit. 2
Flam. Liq. 2
Skin Irrit. 2
STOT SE 3 |
| Hazard Information | Back Directory | [Chemical Properties]
Clear colorless to faintly yellow liquid | [Physical properties]
bp 99–100 °C; n20
D 1.4040; d 0.752 g cm?3. | [Uses]
1,1,3,3-Tetramethyldisilazane is widely used in intramolecular hydrosilation of allyl alcohols, homoallyl
alcohols, and homopropargyl alcohols for the regio- and
stereoselective synthesis of polyols | [Properties and Applications]
The ICP CVD synthesis of SiCxNy: H thin films using 1,1,3,3-tetramethyldisilazane (TMDSZ ) as a single-source precursor and argon as a gas-activator[1]. Using TMDSZ as the single-source compound produced amorphous hydrogenated silicon carbonitride (a-SiCN: H) films, whereas no such films were formed when HMDSZ was used, which was attributed to the lack of Si–H bond in HMDSZ. Under the collision-free condition, the formation of ?CH3, NH3, and DMSA was demonstrated from the decomposition of TMDSZ on the heated W filament. Free-radical short-chain reactions dominate the secondary gas-phase reactions of TMDSZ in the reactor setup. The short-chain reaction is initiated by the formation of methyl radicals via the cleavage of the Si–CH3 bonds of TMDSZ. The H abstraction by the produced methyl radicals from the Si–H or the C–H bond in various stable molecules (e.g., TMDSZ) propagates the chain with a resulting radical, which recombines with another radical to terminate the chain reactions, producing a series of products in the high-mass region[2]. | [References]
[1] Maksim N. Chagin. “Synthesis, Properties and Aging of ICP-CVD SiCxNy:H Films Formed from Tetramethyldisilazane.” Coatings (2022).
[2] James Michael Stevenson, Eric Ampong and Yujun Shi*. “Understanding the Reaction Chemistry of 1,1,3,3-Tetramethyldisilazane as a Precursor Gas in a Catalytic Chemical Vapor Deposition Process.” The Journal of Physical Chemistry A 127 44 (2023): 9185–9195. |
| Spectrum Detail | Back Directory | [Spectrum Detail]
1,1,3,3-TETRAMETHYLDISILAZANE(15933-59-2)MS
1,1,3,3-TETRAMETHYLDISILAZANE(15933-59-2)1HNMR
1,1,3,3-TETRAMETHYLDISILAZANE(15933-59-2)IR1
1,1,3,3-TETRAMETHYLDISILAZANE(15933-59-2)Raman
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| Company Name: |
J & K SCIENTIFIC LTD.
|
| Telephone: |
18210857532 18210857532 |
| Website: |
https://www.jkchemical.com |
| Company Name: |
Alfa Aesar
|
| Telephone: |
400-6106006 |
| Website: |
http://chemicals.thermofisher.cn |
| Company Name: |
Energy Chemical
|
| Telephone: |
400-0056266 |
| Website: |
www.energy-chemical.com |
|