ChemicalBook--->CAS DataBase List--->297730-93-9

297730-93-9

297730-93-9 Structure

297730-93-9 Structure
IdentificationBack Directory
[Name]

2-(TRIFLUOROMETHYL)-3-ETHOXYDODECAFLUOROHEXANE
[CAS]

297730-93-9
[Synonyms]

HFE 7500
Novec 7500
Novec® 7500 Engineered Fluid
3-ETHOXYPERFLUORO(2-METHYLHEXANE)
2-(TRIFLUOROMETHYL)-3-ETHOXYDODECAFLUOROHEXANE
2-(Trifluoromethyl)-3-ethoxydodecafluorohexane99%
2-(Trifluoromethyl)-3-ethoxydodecafluorohexane 99%
2-Trifluoromethyl-3-ethoxydodecafluorohexane(NOVEC 7500)
Hexane, 3-ethoxy-1,1,1,2,3,4,4,5,5,6,6,6-d odecafluoro-2-(trifluoromethyl)-
[EINECS(EC#)]

435-790-1
[Molecular Formula]

C9H5F15O
[MDL Number]

MFCD04038367
[MOL File]

297730-93-9.mol
[Molecular Weight]

414.11
Chemical PropertiesBack Directory
[Melting point ]

-100°C
[Boiling point ]

130°C
[density ]

1,61 g/cm3
[vapor pressure ]

8.466hPa at 20℃
[storage temp. ]

Refrigerator, Under inert atmosphere
[solubility ]

Chloroform (Soluble), Methanol (Slightly)
[form ]

Oil
[color ]

Colourless
[Specific Gravity]

1.61
[Henry's Law Constant]

1.9×10-8 mol/(m3Pa) at 25℃, Ebert et al. (2023)
[Stability:]

Volatile
[InChI]

InChI=1S/C9H5F15O/c1-2-25-6(15,3(10,7(16,17)18)8(19,20)21)4(11,12)5(13,14)9(22,23)24/h2H2,1H3
[InChIKey]

HHBBIOLEJRWIGU-UHFFFAOYSA-N
[SMILES]

C(F)(F)(F)C(F)(C(F)(F)F)C(OCC)(F)C(F)(F)C(F)(F)C(F)(F)F
[LogP]

6 at 23℃
[EPA Substance Registry System]

Hexane, 3-ethoxy-1,1,1,2,3,4,4,5,5,6,6,6-dodecafluoro-2-(trifluoromethyl)- (297730-93-9)
Safety DataBack Directory
[Symbol(GHS) ]

Exclamation Mark (GHS07)
GHS07
[Signal word ]

Warning
[Hazard statements ]

H315-H319-H335
[Precautionary statements ]

P261-P271-P280
[Hazard Codes ]

Xi
[Safety Statements ]

23-24/25
[Hazard Note ]

Irritant
[TSCA ]

T
[REACH Registrations]

Active
[HazardClass ]

IRRITANT
[HS Code ]

2909199050
Hazard InformationBack Directory
[Description]

2-(Trifluoromethyl)-3-ethoxydodecafluorohexane (297730-93-9), also known as HFE-7500 or 3-ethoxy-1,1,1,2, 3,4,4,5,5,6,6,6-dodecafluoro-2-trifluoromethylhexane, is a hydrofluoroether solvent used in the chemical processing of organic electronic materials. Its physical properties make it a suitable alternative to PFCs and PFPE, and it is suitable for heat transfer applications, semiconductor manufacturing processes, the cooling of high-voltage transformers and power electronic devices, as well as pharmaceutical processes such as freeze-drying [1–3] . Furthermore, HFE-7500 is used as the primary refrigerant for preparing suspensions of metal oxide and nitride nanoparticles (such as TiO2, Al2O3, ZnO, CuO and AlN), and dissolves the surfactant Krytox 157-FSL to stabilise the dispersion system [4].
[Uses]

2-(Trifluoromethyl)-3-ethoxydodecafluorohexane (297730-93-9) can be used for temperature sensitive protein expression in protocells. It can also be used for light dispersion with enhanced thermal conductivity containing inorganic particles
[References]

[1] Hu, X., Meng, X., Wei, K., Li, W., Wu, J. (2015). Compressed Liquid Viscosity Measurements of HFE-7000, HFE-7100, HFE-7200, and HFE-7500 at Temperatures from (253 to 373) K and Pressures up to 30 MPa. Journal of Chemical & Engineering Data, 60(12), 3562–3570. https://doi.org/10.1021/acs.jced.5b00499
[2] Gour, N. K., Mishra, B. K., Sarma, P. J., Begum, P., Deka, R. C. (2017). Tropospheric degradation of HFE-7500[ n -C 3 F 7 CF(OCH 2 CH 3 )CF(CF 3 ) 2 ] initiated by OH radicals and Fate of alkoxy radical [ n -C 3 F 7 CF(OCH(O )CH 3 )CF(CF 3 ) 2 ]: A DFT investigation. Journal of Fluorine Chemistry, 204, 11–17. https://doi.org/10.1016/j.jfluchem.2017.09.010
[3] Muñoz-Rujas, N., Bazile, J. P., Aguilar, F., Galliero, G., Montero, E., Daridon, J. L. (2017). Speed of sound and derivative properties of hydrofluoroether fluid HFE-7500 under high pressure. The Journal of Chemical Thermodynamics, 112, 52–58. https://doi.org/10.1016/j.jct.2017.04.007
[4] Ozturk, S., Schmidt, K. (2025). Characterization of HFE 7500 Refrigerant Suspensions Containing Oxide and Nitride Nanoparticles: Thermal, Rheological, and Electrokinetic Insights. ChemEngineering, 9(4), 65. https://doi.org/10.3390/chemengineering9040065
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