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Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)

Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) Struktur
CAS-Nr.
Englisch Name:
Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
Synonyma:
Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
CBNumber:
CB22078243
Summenformel:
O5Ta2
Molgewicht:
441.8928
MOL-Datei:
Mol file
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Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) Eigenschaften

Sicherheit

Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) Chemische Eigenschaften,Einsatz,Produktion Methoden

Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) Upstream-Materialien And Downstream Produkte

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Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) Anbieter Lieferant Produzent Hersteller Vertrieb Händler.

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