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ChemicalBook >제품 카탈로그 >Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)

Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)

Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) 구조식 이미지
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상품명:
Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
동의어(영문):
Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis)
CBNumber:
CB22078243
분자식:
O5Ta2
포뮬러 무게:
441.8928
MOL 파일:
Mol file

Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) 속성

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Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) C화학적 특성, 용도, 생산

Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) 준비 용품 및 원자재

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Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) 공급 업체

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Tantalum (V) oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick, 99.99% (metals basis) 관련 검색:

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