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ChemicalBook >> CAS DataBase List >> TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) price.
  • $85 - $2480
  • Product name: TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)
  • CAS: 19782-68-4
  • MF: C8H24HfN4
  • MW: 354.79
  • EINECS:
  • MDL Number:MFCD01862473
  • Synonyms:Tetrakis(dimethylamido)hafnium(IV),TDMAH, Tetrakis(dimethylamino)hafnium(IV);TDMAH;Tetrakis(dimethylamino)hafnium(IV) 99.999%;Dimethylamine hafnium(4+) salt;Hafnium tetradimethylamide;Hafnium(4+) dimethylamide;TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV), 99.99+%;Tetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems
Price11 Properties Safety Information Description
11 prices
Selected condition：
Brand
  • Oakwood
  • Sigma-Aldrich
  • Strem Chemicals
Package
  • 1g
  • 5g
  • 25g
  • 100g
  • ManufacturerOakwood
  • Product number098981
  • Product descriptionTetrakis(dimethylamido)hafnium(IV)
  • Packaging100g
  • Price$1895
  • Updated2021-12-16
  • Buy
  • ManufacturerOakwood
  • Product number098981
  • Product descriptionTetrakis(dimethylamido)hafnium(IV)
  • Packaging25g
  • Price$665
  • Updated2021-12-16
  • Buy
  • ManufacturerOakwood
  • Product number098981
  • Product descriptionTetrakis(dimethylamido)hafnium(IV)
  • Packaging5g
  • Price$220
  • Updated2021-12-16
  • Buy
  • ManufacturerOakwood
  • Product number098981
  • Product descriptionTetrakis(dimethylamido)hafnium(IV)
  • Packaging1g
  • Price$85
  • Updated2021-12-16
  • Buy
  • ManufacturerSigma-Aldrich
  • Product number455199
  • Product descriptionTetrakis(dimethylamido)hafnium(IV) ≥99.99%
  • Packaging25g
  • Price$1180
  • Updated2024-03-01
  • Buy
  • ManufacturerSigma-Aldrich
  • Product number666610
  • Product descriptionTetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems
  • Packaging25g
  • Price$2480
  • Updated2024-03-01
  • Buy
  • ManufacturerStrem Chemicals
  • Product number72-8000
  • Product descriptionTetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM
  • Packaging1g
  • Price$133
  • Updated2024-03-01
  • Buy
  • ManufacturerStrem Chemicals
  • Product number72-8000
  • Product descriptionTetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM
  • Packaging5g
  • Price$351
  • Updated2024-03-01
  • Buy
  • ManufacturerStrem Chemicals
  • Product number72-8000
  • Product descriptionTetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM
  • Packaging25g
  • Price$1047
  • Updated2024-03-01
  • Buy
  • ManufacturerStrem Chemicals
  • Product number98-4021
  • Product descriptionTetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD
  • Packaging25g
  • Price$2044
  • Updated2024-03-01
  • Buy
  • ManufacturerStrem Chemicals
  • Product number98-4022
  • Product descriptionTetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok(R) cylinder (96-1071) for CVD/ALD
  • Packaging25g
  • Price$2343
  • Updated2024-03-01
  • Buy
Manufacturer Product number Product description Packaging Price Updated Buy
Oakwood 098981 Tetrakis(dimethylamido)hafnium(IV) 100g $1895 2021-12-16 Buy
Oakwood 098981 Tetrakis(dimethylamido)hafnium(IV) 25g $665 2021-12-16 Buy
Oakwood 098981 Tetrakis(dimethylamido)hafnium(IV) 5g $220 2021-12-16 Buy
Oakwood 098981 Tetrakis(dimethylamido)hafnium(IV) 1g $85 2021-12-16 Buy
Sigma-Aldrich 455199 Tetrakis(dimethylamido)hafnium(IV) ≥99.99% 25g $1180 2024-03-01 Buy
Sigma-Aldrich 666610 Tetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems 25g $2480 2024-03-01 Buy
Strem Chemicals 72-8000 Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM 1g $133 2024-03-01 Buy
Strem Chemicals 72-8000 Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM 5g $351 2024-03-01 Buy
Strem Chemicals 72-8000 Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM 25g $1047 2024-03-01 Buy
Strem Chemicals 98-4021 Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD 25g $2044 2024-03-01 Buy
Strem Chemicals 98-4022 Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok(R) cylinder (96-1071) for CVD/ALD 25g $2343 2024-03-01 Buy

Properties

Melting point :26-29 °C(lit.)
Boiling point :85°C/0.1mm
Density :1.098 g/mL at 25 °C
Flash point :109 °F
form :crystal
color :colorless to pale yellow
Specific Gravity :1.40
Hydrolytic Sensitivity :8: reacts rapidly with moisture, water, protic solvents
Sensitive :moisture sensitive, store cold
InChIKey :ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
CAS DataBase Reference :19782-68-4

Safety Information

Symbol(GHS): GHS hazard pictogramsGHS hazard pictograms
Signal word: Danger
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
H228 Flammable solid Flammable solids Category 1
Category 2		 Danger
Warning		 GHS hazard pictograms P210, P240,P241, P280, P370+P378
H261 In contact with water releases flammable gas Substances And Mixtures Which, In Contact With Water,Emit Flammable Gases Category 2
Category 3		 Danger
Warning		 GHS hazard pictograms P231+P232, P280, P370+P378,P402+P404, P501
H314 Causes severe skin burns and eye damage Skin corrosion/irritation Category 1A, B, C Danger GHS hazard pictograms P260,P264, P280, P301+P330+ P331,P303+P361+P353, P363, P304+P340,P310, P321, P305+ P351+P338, P405,P501
Precautionary statements:
P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking.
P231+P232 Handle under inert gas. Protect from moisture.
P280 Wear protective gloves/protective clothing/eye protection/face protection.
P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.
P370+P378 In case of fire: Use … for extinction.
P402+P404 Store in a dry place. Store in a closed container.

Description

Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices.

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