| Identification | Back Directory | [Name]
HAFNIUM NITRIDE | [CAS]
25817-87-2 | [Synonyms]
HAFNIUM NITRIDE
hafniumnitride(hfn)
Hafnium mononitride
Hafnium(III) nitride
Hafnium nitride (HfN)
Hafniumnitridehfnf.w.192.50powder
Micro-nano Hafnium Nitride Powder
HAFNIUM NITRIDE ISO 9001：2015 REACH
Hafnium nitride, 99% (metals basis)
Chromium Titanium (Cr-Ti) Alloy Sputtering Targets | [EINECS(EC#)]
247-282-3 | [Molecular Formula]
HfN | [MDL Number]
MFCD00016129 | [MOL File]
25817-87-2.mol | [Molecular Weight]
192.5 |
| Hazard Information | Back Directory | [Chemical Properties]
yellowish brown crystal(s); fcc, a=0.4518nm; most refractory of all known metal nitrides; hardness 1640kgf/mm2; electrical resistivity 33μohm· cm; can be prepared by heating Hf in N2 or NH3 atmospheric at 1000°C–1500°C; as a 99.5% pure material, used as a sputtering target to increase electrical stability of diodes, transistors, and integrated circuits [KIR80] [KIR81] [HAW93] [CER91] | [Physical properties]
Most refractory of all nitrides. | [Uses]
Hafnium nitride exhibits outstanding mechanical, electrical, optical, high-temperature resistance, and corrosion resistance properties, making it highly valuable in fields such as mechanical manufacturing and microelectronics.
Nano-sized hafnium nitride finds widespread applications in the semiconductor, optoelectronics, and precision machining industries. In particular, nano-HfN thin films show great potential as high-efficiency anti-reflective protective coatings for optical windows, especially for critical optical components in aerospace systems. | [Preparation]
Hafnium nitride can be produced either through the direct reaction of hafnium with nitrogen at 900°C, or via the reaction of hafnium halides with ammonia or a nitrogen-hydrogen gas mixture. |
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