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TRIS(DIMETHYLAMIDO)GALLIUM(III) 98

CAS No.
57731-40-5
Chemical Name:
TRIS(DIMETHYLAMIDO)GALLIUM(III) 98
Synonyms
amino)g;amino)gaL;ium(III) dimer;Tris(dimethylamino)gallane;Hexakis(dimethylamido)digallium;tris(dimethylamido)gallium(iii);TRIS(DIMETHYLAMIDO)GALLIUM(III) 98;Tris(dimethylamino)gallium(III) dimer;N-bis(dimethylamino)gallanyl-N-methyl-methanamine;Bis(diMethylaMino)tetrakis(diMethylaMino)digalliuM,98%
CBNumber:
CB8504731
Molecular Formula:
C12H36Ga2N6
Molecular Weight:
403.91
MDL Number:
MFCD11973803
MOL File:
57731-40-5.mol
MSDS File:
SDS
Last updated:2023-04-23 13:52:06

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Properties

Melting point 104-105.5 °C(lit.)
Boiling point 55.7 °C760 mm Hg
Flash point 56 °C
form crystal
color white
Water Solubility Miscible with Water.
Sensitive Moisture Sensitive

SAFETY

Risk and Safety Statements

Symbol(GHS)  GHS hazard pictogramsGHS hazard pictograms
GHS02,GHS05
Signal word  Danger
Hazard statements  H228-H314-H261-H318
Precautionary statements  P303+P361+P353-P402+P404-P210-P280-P305+P351+P338-P310
Hazard Codes  F,C
Risk Statements  11-14-34
Safety Statements  16-26-36/37/39-45
RIDADR  UN 2925 4.1/PG 2
WGK Germany  3
HazardClass  4.3
NFPA 704
2
3 2
W

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 price More Price(5)

Manufacturer Product number Product description CAS number Packaging Price Updated Buy
Alfa Aesar 040443 Tris(dimethylamino)gallium(III) dimer, 99.9% (metals basis) 57731-40-5 2.5g $364 2024-03-01 Buy
Strem Chemicals 31-2030 Bis(μ-dimethylamino)tetrakis(dimethylamino)digallium, 98% 57731-40-5 1g $93 2024-03-01 Buy
Strem Chemicals 31-2030 Bis(μ-dimethylamino)tetrakis(dimethylamino)digallium, 98% 57731-40-5 5g $368 2024-03-01 Buy
Strem Chemicals 31-2030 Bis(μ-dimethylamino)tetrakis(dimethylamino)digallium, 98% 57731-40-5 25g $1469 2024-03-01 Buy
American Custom Chemicals Corporation ING0010984 TRIS(DIMETHYLAMIDO)GALLIUM(III) 95.00% 57731-40-5 5MG $497.77 2021-12-16 Buy
Product number Packaging Price Buy
040443 2.5g $364 Buy
31-2030 1g $93 Buy
31-2030 5g $368 Buy
31-2030 25g $1469 Buy
ING0010984 5MG $497.77 Buy

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Chemical Properties,Uses,Production

Uses

Tris(dimethylamido)gallium(III) can be used in the following fields:

  1. Reagent used for the growth of gallium oxide films via the reaction with alcohols or water.
  2. Complex used for the ALD of gallium oxide films.
  3. Complex used in a new pyrolysis route to GaN quantum dots.
  4. Complex used for the generation of monodispersed, colloidal gallium nanoparticles.
  5. Complex used for the atomic layer deposition of gallium sulfide films. 

Uses

Gallium nitride film precursor. Used as Reagent.

General Description

Atomic number of base material: 31 Gallium

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Preparation Products And Raw materials

Raw materials

Preparation Products

Global( 36)Suppliers
Supplier Tel Email Country ProdList Advantage
CONIER CHEM AND PHARMA LIMITED
+8618523575427 sales@conier.com China 49390 58
Zhengzhou Alfa Chemical Co.,Ltd
+8618530059196 sale04@alfachem.cn China 12468 58
Career Henan Chemica Co
+86-0371-86658258 15093356674; laboratory@coreychem.com China 30255 58
Hefei TNJ Chemical Industry Co.,Ltd.
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Hunan russell chemicals technology co ltd
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Xi'an MC Biotech, Co., Ltd.
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LEAPCHEM CO., LTD.
+86-852-30606658 market18@leapchem.com China 43348 58
J & K SCIENTIFIC LTD. 010-82848833 400-666-7788 jkinfo@jkchemical.com China 96815 76
INTATRADE GmbH +49 3493/605464 sales@intatrade.de Germany 3576 66
Alfa Aesar 400-6106006 saleschina@alfa-asia.com China 30132 84

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Spectrum

Bis[miu-(N-Methylmethanaminato)]tetrakis(N-methylmethanaminato)digallium Hexakis(dimethylamido)digallium Tris(dimethylamino)gallane Bis(diMethylaMino)tetrakis(diMethylaMino)digalliuM,98% Tris(diMethylaMino)galliuM(III) diMer, 99.9% (Metals basis) tris(dimethylamido)gallium(iii) TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Tris(dimethylamino)gallium(III) dimer Bis(mu-dimethylamino)tetrakis(dimethylamino)digallium, 98% amino)g ium(III) dimer amino)gaL N-bis(dimethylamino)gallanyl-N-methyl-methanamine 57731-40-5 2C6H18GaN3 GaNCH323 C12H36Ga2N6 GalliumVapor Deposition Precursors Catalysis and Inorganic Chemistry Chemical Synthesis Gallium Precursors by Metal organometallic complex