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ChemicalBook CAS DataBase List Triethoxyvinylsilane

Triethoxyvinylsilane synthesis

10synthesis methods
-

Yield:78-08-0 96.7%

Reaction Conditions:

at 90; under 225.023 - 375.038 Torr;Temperature;

Steps:

6 Example 6

Trichlorosilane obtained from the reaction of hydrogen chloride and silicon powder at 230 deg.C ~ 260 deg.C and ethanol, respectively, are pumped with a metering pump into the double column reactors. Raise temperature to 80 deg.C. Activate the reactor circulation pump. The hydrogen chloride produced by the process undergoes cryogenic cooling. After compression, return to the trichlorosilane synthesis device. After reacting for 6h, the solution was neutralized, rectify to obtain triethoxysilane. Yield of 86%. The solvent bis(triethoxy)silylethaneis pumped into the reactor, the catalyst was added, Heat to 90 deg. C. Then triethoxysilane enters the synthesis tank and at same time open the acetylene intake valve. Start the reaction. Reactor pressure is 30kpa. When the reactor pressure starts to slowly rise to 50kpa, the reaction is stopped. The feed liquid intothe distillation column distillation top product vinyltriethoxysilane, bottoms by product bis (triethoxysilyl) ethane recovery silicon as a reaction solvent.Product yield was 96.7%, purity> 99%.

References:

CN105367598,2016,A Location in patent:Paragraph 0041; 0042

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