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ChemicalBook CAS DataBase List VINYLACETIC ACID

VINYLACETIC ACID synthesis

14synthesis methods
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Yield:3724-65-0 11 %Chromat. ,625-38-7 88 %Chromat.

Reaction Conditions:

with Hoveyda-Grubbs catalyst second generation in diethylene glycol dimethyl ether;toluene at 50; under 22502.3 Torr; for 2 h;Inert atmosphere;Autoclave;

Steps:

2 Example 2: Ethenol sis of methyl pentenoates and pentenoic acids
General procedure: Example 2: Ethenol sis of methyl pentenoates and pentenoic acids A 300-mL stainless steel autoclave was evacuated and refilled with argon three times to remove air. Pentenoic acid (obtained from Example 1) or methyl pentenoate substrate dissolved in a suitable solvent was introduced under argon stream followed by metathesis catalyst dissolved in 50 mL of toluene. The reactor was then subjected to three times of pressurising-purging cycle with ethylene ( 10 bar) before finally being pressurized with ethylene to 30 bar. The reactor was then heated to the reaction temperature. At the end of the reaction, the vessel was cooled to room temperature, the excess gas was vented and 1.5 mL of ethyl vinyl ether was added to prevent any further reaction. An accurately weighed amount of anisole (internal standard, 0.5 mL) was added to each reaction mixture before the reaction. The yields of the reaction were determined via GC analysis and summarized in Tables 1 and 2. Table 1 shows the yields of the reaction when pentenoic acid isomers were used as the starting material, whereas Table 2 summarizes the yields of the reaction when pentenoate esters were used as the reactants. The structures of the metathesis catalysts used in these examples are shown in Scheme 8. Table 1. The ethenolysis of pentenoic acid isomers and mixtures thereof. Conditions: 1 mol catalyst, 50 mL of diglyme, ethylene (30 bar), 800 rpm of mechanical stirring, 50°C, duration = 2 hours (* 16 hours). FontWeight="Bold" FontSize="10" AA = acrylic acid, BEA = butenoic acid, PEA = pentenoic acid.

References:

AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH;VAN MEURS, Martin;NOBBS, James David;STUBBS, Ludger Paul WO2017/135898, 2017, A1 Location in patent:Page/Page column 33; 34

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